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A novel microwave plasma reactor with a unique structure for chemical vapor deposition of diamond films

โœ Scribed by Su, J.J.; Li, Y.F.; Li, X.L.; Yao, P.L.; Liu, Y.Q.; Ding, M.H.; Tang, W.Z.


Book ID
121652603
Publisher
Elsevier Science
Year
2014
Tongue
English
Weight
823 KB
Volume
42
Category
Article
ISSN
0925-9635

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