A new vertically layered elevated hot carrier resistant source/drain structure for deep submicron MOSFETs

✍ Scribed by Marius Orlowski; Carlos Mazuré; Matthew Noell

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 210 KB
• Volume: 15
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(91)90258-f