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A new removable resist for high aspect ratio applications

✍ Scribed by Matthias Schirmer; Doris Perseke; Eva Zena; Daniel Schondelmaier; Ivo Rudolph; Bernd Loechel

Book ID
106185093
Publisher
Springer-Verlag
Year
2006
Tongue
English
Weight
276 KB
Volume
13
Category
Article
ISSN
0946-7076

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✍ Takaaki Konishi; Hisao Kikuta; Hiroaki Kawata; Yoshihiko Hirai πŸ“‚ Article πŸ“… 2006 πŸ› Elsevier Science 🌐 English βš– 591 KB

Multi-layered resist process for nanoimprint lithography is newly proposed to fabricate high aspect ratio pattern under low pressured condition. A low molecular weight polymer is coated on a high molecular weight polymer and a mold is pressed to the bi-layered resist structure over the glass transit