✦ LIBER ✦

A new lithography technique using super-resolution near-field structure

✍ Scribed by M. Kuwahara; T. Nakano; J. Tominaga; M.B. Lee; N. Atoda

Book ID: 104305499
Publisher: Elsevier Science
Year: 2000
Tongue: English
Weight: 802 KB
Volume: 53
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(00)00372-5

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✦ Synopsis

We have succeeded in fabricating narrow grooves in a photoresist film by a new lithography technique using an optical near-field with 365nm and 440nm light sources. This technique makes use of super-resolution near-field structure (Super-RENS) which is composed of multilayres to convert a focused laser beam to optical near-field. By this technique, grooves with linewidth of 100-nm-order could be produced beyond diffraction limit at high speed.

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