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A new design of a compact high current ion accelerator

✍ Scribed by G. Proudfoot; R. McAdams; A.J.T. Holmes


Book ID
113285223
Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
671 KB
Volume
89
Category
Article
ISSN
0168-583X

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Ion implantation is of great importance in semiconductor device fabrication. Owing to the increasing interest of" the microelectronic industry in the implantation of ions in the megaelectronvolt energy range, high energy beams are required. Furthermore, for several applications the implanted dose is