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A multiple-electron-beam exposure system for high-throughput, direct-write submicrometer lithography

✍ Scribed by Brodie, I.; Westerberg, E.R.; Cone, D.R.; Muray, J.J.; Williams, N.; Gasiorek, L.

Book ID
114593969
Publisher
IEEE
Year
1981
Tongue
English
Weight
893 KB
Volume
28
Category
Article
ISSN
0018-9383

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