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A metastable NiSi phase epitaxially grown on 〈111〉 silicon by pulsed laser quenching

✍ Scribed by P. Baeri; M.G. Grimaldi; F. Priolo; E. Rimini; A.G. Cullis; N.G. Chew

Book ID: 116016922
Publisher: Elsevier Science
Year: 1988
Weight: 464 KB
Volume: 145
Category: Article
ISSN: 0022-5088
DOI: 10.1016/0022-5088(88)90275-5

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