✦ LIBER ✦

A high-energy, high-current ion implantation system

✍ Scribed by Peter H. Rose; Ronald Faretra; Geoffery Ryding

Book ID: 113277308
Publisher: Elsevier Science
Year: 1985
Tongue: English
Weight: 814 KB
Volume: 6
Category: Article
ISSN: 0168-583X
DOI: 10.1016/0168-583x(85)90605-6

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Ion implantation is of great importance in semiconductor device fabrication. Owing to the increasing interest of" the microelectronic industry in the implantation of ions in the megaelectronvolt energy range, high energy beams are required. Furthermore, for several applications the implanted dose is