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A dual-source low-energy mass-analysed ion beam system for semiconductor epitaxy and novel materials growth

✍ Scribed by J.S. Gordon; D.G. Armour; S.E. Donnelly; J.A. van den Berg; D. Marton; J.W. Rabalais

Book ID: 113281552
Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 360 KB
Volume: 59-60
Category: Article
ISSN: 0168-583X
DOI: 10.1016/0168-583x(91)95230-b

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