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A comparison of the electron beam sensitivities and relative oxygen plasma etch rates of various organosilicon polymers

✍ Scribed by E. Babich; J. Paraszczak; M. Hatzakis; J. Shaw; B.J. Grenon

Publisher: Elsevier Science
Year: 1985
Tongue: English
Weight: 740 KB
Volume: 3
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(85)90038-3

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