A comparison of the E-beam and UV-sensitivities and relative O2- plasma stabilities of organosilicon polymers.Part II. Lithographic characteristics of polysilphenylene siloxanes and some organic polymers with pendant silyl groups

✍ Scribed by E. Babich; J. Shaw; M. Hatzakis; J. Paraszczak; R.W. Lenz; P.R. Dvornich

• Publisher: Elsevier Science
• Year: 1987
• Tongue: English
• Weight: 218 KB
• Volume: 6
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(87)90081-5