A comparative study of silicon deposition from SiCl4 in cold plasma using argon, H2 or Ar + H2

✍ Scribed by R.R. Manory; U. Carmi; R. Avni; A. Grill

• Publisher: Elsevier Science
• Year: 1988
• Tongue: English
• Weight: 606 KB
• Volume: 156
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(88)90284-2