A comparative study of silicon deposition from SiCl4 in cold plasma using argon, H2 or Ar+H2: R P Manory et al,Thin Solid Films,156, 1988, 79–92

• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 154 KB
• Volume: 39
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(89)90807-5