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A comparative study of Ga(CH3)3, Ga(C2H5)3 and Ga(C4H9)3 in the low pressure MOCVD of GaAs

✍ Scribed by C. Plass; H. Heinecke; O. Kayser; H. Lüth; P. Balk

Publisher
Elsevier Science
Year
1988
Tongue
English
Weight
890 KB
Volume
88
Category
Article
ISSN
0022-0248

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