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A batch process to deposit amorphous metallic Mo–Si–N films

✍ Scribed by H. Kattelus; H. Heikkinen; A. Häärä; M. Ylönen; A. Tolkki


Book ID
110442417
Publisher
Springer US
Year
2003
Tongue
English
Weight
536 KB
Volume
14
Category
Article
ISSN
0957-4522

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Potential of amorphous Mo–Si–N films for
✍ M. Ylönen; H. Kattelus; A. Savin; P. Kivinen; T. Haatainen; J. Ahopelto 📂 Article 📅 2003 🏛 Elsevier Science 🌐 English ⚖ 123 KB

The properties of amorphous metallic molybdenum-silicon-nitrogen (Mo-Si-N) films were characterised for use in nanoelectronic applications. The films were deposited by co-sputtering of molybdenum and silicon targets in a gas mixture of argon and nitrogen. The atomic composition, microstructure and s