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1H Nuclear Magnetic Resonance of Thermally Grown Silicon Dioxide Films

✍ Scribed by Levy, D. H.


Book ID
118138476
Publisher
The Electrochemical Society
Year
1993
Tongue
English
Weight
528 KB
Volume
140
Category
Article
ISSN
0013-4651

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At various stages of in situ therm31 oxiclztion of Si(lll) monocrystals, X-ray photoelectron spectroscopy (XPS or ESCA) t-eve& a shift in the silicon core-level binding energies which vties continuously from 2.4 to 4.2 eV. From the oxygen &d silicon ESCA peak intensities, these films un be said to h