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Zirconium acetylacetonate as a precursor for the chemical vapour deposition of ZrO2

✍ Scribed by N. Dzjubenko; L. Martynenko; N. Zharkova; E. Gavrischuk; A. Gibin


Book ID
103954212
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
138 KB
Volume
18
Category
Article
ISSN
0921-5107

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Chemical vapour deposition of the oxides
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A brief survey of the precursors used for the chemical vapour deposition of the dioxides of titanium, zirconium and hafnium is presented. The review covers precursors used for the closely related process known as atomic layer chemical vapour deposition (ALCVD or ALD). Precursors delivered by standar