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Y2O3 thin films: internal stress and microstructure

✍ Scribed by R.J Gaboriaud; F Paumier; F Pailloux; P Guerin


Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
363 KB
Volume
109
Category
Article
ISSN
0921-5107

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Y 2 O 3 thin films were grown on silicon (1 0 0) substrates by pulsed-laser deposition at different substrate temperatures and O 2 pressures. The structure and composition of films are studied by using X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). The Y 2 O 3 thin films deposit