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XPS Study of the Thermal Instability of HfO[sub 2] Prepared by Hf Sputtering in Oxygen with RTA

✍ Scribed by Zhan, Nian; Poon, M. C.; Kok, C. W.; Ng, K. L.; Wong, Hei

Book ID: 118129602
Publisher: The Electrochemical Society
Year: 2003
Tongue: English
Weight: 91 KB
Volume: 150
Category: Article
ISSN: 0013-4651
DOI: 10.1149/1.1608006

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