XPS and AFM characterization of a vanadium oxide film on TiO2(100) surface
โ Scribed by G. Chiarello; R. Barberi; A. Amoddeo; L.S. Caputi; E. Colavita
- Publisher
- Elsevier Science
- Year
- 1996
- Tongue
- English
- Weight
- 485 KB
- Volume
- 99
- Category
- Article
- ISSN
- 0169-4332
No coin nor oath required. For personal study only.
๐ SIMILAR VOLUMES
Micro-arrayed patterns of p-type copper sulfide (Cu x S) thin films with positive and negative features were deposited onto the surfaces of n-type TiO 2 semiconductor films via a selective nucleation and growth process from aqueous solution. The surface functional molecules of the UV photo-oxidised
Metalloporphyrins bound to silicon wafers exhibit a redox behaviour useful for information storage and resist the conditions of temperature required for processing real devices. An XPS and AFM study has been undertaken to evidence and understand the electronic states of different free bases and meta
Tin dioxide L-CVD thin