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X-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectrometry (ToF-SIMS) analysis of UV-exposed polystyrene

✍ Scribed by Richard M. France; Liam O'Toole; Robert D. Short; Nino Pollicino


Publisher
John Wiley and Sons
Year
1995
Tongue
English
Weight
609 KB
Volume
196
Category
Article
ISSN
1022-1352

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✦ Synopsis


Abstract

The surface photochemistry of polystyrene is shown to exhibit features that distinguish it from the bulk and from the polymer in solution. We report on the use of medium‐ and high‐resolution time‐of‐flight secondary ion mass spectrometry and X‐ray photoelectron spectroscopy in an investigation of the changes that occur as a result of exposure to UV light from a ‘black lamp’ source. The experiment mimics closely the effects of natural sunlight. It is shown that there are substantial changes occurring in the surface molecular structure of polystyrene on irradiation, which correspond to loss of aromaticity, and that these changes precede any uptake of oxygen.


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