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X-ray photoelectron spectroscopy of erbium-activated-silica–hafnia waveguides

✍ Scribed by L. Minati; G. Speranza; M. Ferrari; Y. Jestin; A. Chiasera

Book ID
116669887
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
134 KB
Volume
353
Category
Article
ISSN
0022-3093

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This paper describes the characterization by x-ray photoelectron spectroscopy (XPS) of several Ge-doped silica glasses before and after reactive ion etching (ME) in sulphur hexafluoride (SF,). These glasses have been commonly used in the production of optical waveguides, with varying amounts of GeO,