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X-ray photoelectron spectroscopy of amorphous AlN alloys prepared by reactive rf sputtering

โœ Scribed by C.T.M Ribeiro; A.R Zanatta; F Alvarez

Book ID
117145652
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
565 KB
Volume
299-302
Category
Article
ISSN
0022-3093

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Reactively DC magnetron sputtered thin AlN films studied by X-ray photoelectron spectroscopy and polarised infrared reflection
โœ D. Manova; V. Dimitrova; D. Karpuzov; R. Yankov ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 324 KB

Aluminium nitride thin films were deposited by reactive d.c. magnetron sputtering on various substrates. The analytical tools used to characterise the aluminium nitride thin films were electron beam diffraction, X-ray photoelectron spectroscopy, energy dispersive X-ray analysis and polarised infrare