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X-ray photoelectron spectroscopic characterization of ultra-thin silicon oxide films on a Mo(100) surface

โœ Scribed by J.-W. He; X. Xu; J.S. Corneille; D.W. Goodman

Publisher
Elsevier Science
Year
1992
Weight
60 KB
Volume
279
Category
Article
ISSN
0167-2584

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Synthesis and characterization of ultra-
Synthesis and characterization of ultra-thin MgO films on Mo(100)
โœ Ming-Cheng Wu; Jason S. Corneille; Cesar A. Estrada; Jian-Wei He; D. Wayne Goodm ๐Ÿ“‚ Article ๐Ÿ“… 1991 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 529 KB

Ultra-thin MgO films have been synthesized under UHV conditions by evaporating Mg onto Mo( 100) in various background pressures of oxygen. Low-energy electron diffraction (LEED) studies show that MgO films grow epitaxially in the 200-600 K substrate temperature range with the (100) face ofMg0 orient