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X-ray diffraction using combined film and microprocessor techniques

โœ Scribed by Samuelsen, E. J.


Book ID
114500037
Publisher
International Union of Crystallography
Year
1987
Tongue
English
Weight
707 KB
Volume
20
Category
Article
ISSN
0021-8898

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## Abstract The results of a study of oxide precipitates in Czochralski (CZ) grown silicon using two Xโ€ray diffraction methods are reported. The diffuse scattering around the Bragg diffraction maxima was measured on a series of samples after various twoโ€stage annealing treatment. Combining the anal