X-ray diffraction at elevated temperatures: A method for in situ process analysis: By D. D. L. Chung, P. W. DeHaven, H. Arnold, and Debashis Ghosh. VCH Publishers, New York, 1993, 268 pages, price $95

✍ Scribed by Kurt Nassau

• Book ID: 113189421
• Publisher: Elsevier Science
• Year: 1996
• Tongue: English
• Weight: 145 KB
• Volume: 31
• Category: Article
• ISSN: 0025-5408
• DOI: 10.1016/0025-5408(96)80011-0