Work function of Ni3Si2 on HfSixOy and SiO2 and its implication for Ni fully silicided gate applications

✍ Scribed by Kittl, J. A.; OSullivan, B. J.; Kaushik, V. S.; Lauwers, A.; Pawlak, M. A.; Hoffmann, T.; Demeurisse, C.; Vrancken, C.; Veloso, A.; Absil, P.; Biesemans, S.

• Book ID: 111923913
• Publisher: American Institute of Physics
• Year: 2007
• Tongue: English
• Weight: 332 KB
• Volume: 90
• Category: Article
• ISSN: 0003-6951
• DOI: 10.1063/1.2430687