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Work function measurements during growth of ultra thin films of SiO2 on characterized silicon surfaces

✍ Scribed by C. Raisin; E. Vieujot-Testemale; A.Ben Brahim; J.M. Palau; L. Lassabatere

Publisher: Elsevier Science
Year: 1984
Tongue: English
Weight: 389 KB
Volume: 27
Category: Article
ISSN: 0038-1101
DOI: 10.1016/0038-1101(84)90147-3

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