Mathematical modeling for the compositio
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Jae-Keun Kim; J.S. Colligon; Sang-Hun Jeong
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Article
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2004
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Elsevier Science
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English
⚖ 305 KB
A simple general model has been formulated to explain the composition of compound films during growth simultaneous with ion bombardment. The variables in this model are (a) the sticking probability of the background residual reactive gas in the film, (b) an ion-enhanced sticking probability of these