Width dependence of the effectiveness of reservoir length in improving electromigration for Cu/Low-k interconnects

✍ Scribed by C.M. Fu; C.M. Tan; S.H. Wu; H.B. Yao

• Book ID: 108210902
• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 661 KB
• Volume: 50
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/j.microrel.2010.07.133