Bio Nano Consulting
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Article
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2009
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Elsevier Science
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English
⚖ 96 KB
The JEOL JBX-6300FS direct write ebeam system is capable of writing line widths down to 8 nm on substrates up to 200 mm in diameter in both nanolithography and high throughput mode. It is a spot beam, vector scan, step and repeat lithography system designed for small volume production as well as res