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The JEOL JBX-6300FS direct write ebeam system is capable of writing line widths down to 8 nm on substrates up to 200 mm in diameter in both nanolithography and high throughput mode. It is a spot beam, vector scan, step and repeat lithography system designed for small volume production as well as research and design or "sandbox lithography." The JBX-6300FS excels at nano-imprint lithography (NIL), a method of fabricating next-generation nanometer scale patterns onto 65 mm photo mask templates and finally creating the high resolution patterns directly on wafers through a 1X nanoimprint process.
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## TOOLS & TECHNIQUES UPDATE Widening your scope Oxford nanoScience has increased the field of view in its voltage-and laserpulsed three-dimensional atom probes (3DAPs) by 2.5 times without sacrificing mass resolution. Analyzing larger volumes not only allows larger clusters and precipitates to be