✦ LIBER ✦

Very high current ECR ion source for an oxygen ion implanter

✍ Scribed by Yasuhiro Torii; Masaru Shimada; Iwao Watanabe

Book ID: 113278737
Publisher: Elsevier Science
Year: 1987
Tongue: English
Weight: 272 KB
Volume: 21
Category: Article
ISSN: 0168-583X
DOI: 10.1016/0168-583x(87)90820-2

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Very high current ECR ion source

✍ Masaru Shimada; Iwao Watanabe; Yasuhiro Torii 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 369 KB

High-current ECR ion source

✍ G. Voronin; D. Solnyshkov; M. Svinin; A. Solnyshkov 📂 Article 📅 2000 🏛 Elsevier Science 🌐 English ⚖ 418 KB

Plasma filament ion source for high curr

Plasma filament ion source for high current implanter

✍ E. Yabe; N. Ishizaka; T. Shibuya; A. Tonegawa; K. Takayama; R. Fukui; K. Takagi; 📂 Article 📅 1987 🏛 Elsevier Science 🌐 English ⚖ 292 KB

High-current ion sources for ion implant

High-current ion sources for ion implantation

✍ R. Keller 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 419 KB

New microwave ion source for high energy

New microwave ion source for high energy ion implanter

✍ K. Amemiya; K. Tokiguchi; H. Koike; T. Seki; N. Sakudo 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 289 KB

High current ECR source of multicharged

High current ECR source of multicharged ion beams

✍ S. Golubev; I. Izotov; S. Razin; A. Sidorov; V. Skalyga; A. Vodopyanov; V. Zorin 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 233 KB

Great demand for multicharged ion (MCI) sources stimulated investigation of new methods of producing plasma by means of ECR gas discharge in magnetic traps. The authors of this research propose a new type of pulsed sources of MCI, namely, a quasi-gasdynamic ECR source. Its main difference from the c