✦ LIBER ✦

Variable-shaped electron-beam direct writing technology for 1-µm VLSI fabrication

✍ Scribed by Sakakibara, Y.; Ogawa, T.; Komatsu, K.; Moriya, S.; Kobayashi, M.; Kobayashi, T.

Book ID: 114593954
Publisher: IEEE
Year: 1981
Tongue: English
Weight: 864 KB
Volume: 28
Category: Article
ISSN: 0018-9383
DOI: 10.1109/t-ed.1981.20600

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Submicrometer electron-beam direct writi

Submicrometer electron-beam direct writing technology for 1-Mbit DRAM fabrication

✍ Matsuda, T.; Miyoshi, K.; Yamaguchi, R.; Moriya, S.; Hosoya, T.; Harada, K. 📂 Article 📅 1985 🏛 IEEE 🌐 English ⚖ 908 KB

Cellector: A new software tool for the s

Cellector: A new software tool for the support of cell projection in combination with variable shape electron beam lithography for mask and direct write applications

✍ H. Hartmann; R. Steinmetz; T. Waas; P. Hahmann; Ch. Ehrlich 📂 Article 📅 1999 🏛 Elsevier Science 🌐 English ⚖ 690 KB

## Ab~ra~ A new software tool for the support of cell projection in combination with variable shape electron beam lithography for mask making and direct write application is described. The program has been designed and developed for the WePrint 200, a new variable shape electron beam lithography s

Electron beam direct writing technology

Electron beam direct writing technology applied to 512 Kbit ROM with 1 μm geometry : Katumi Suzuki, Mitsutaka Morimoto, Nobuhiro Endo, Masunori Sugimoto, Yasuo Iida, Yukinori Kurogi and Katsumi Mori. IEEE Trans. Electron DevicesED-28 (9), 1088 (1981)

📂 Article 📅 1983 🏛 Elsevier Science 🌐 English ⚖ 134 KB