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Vapour deposited aluminium alloys

✍ Scribed by R.W. Gardiner

Publisher
Elsevier Science
Year
1989
Weight
926 KB
Volume
10
Category
Article
ISSN
0261-3069

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πŸ“œ SIMILAR VOLUMES

Chemical and plasmachemical vapour depos
Chemical and plasmachemical vapour deposition of aluminium nitride layers
✍ Prof. Dr. H. Arnold; Dipl.-Chem. L. Biste; Dipl.- Ing. D. Bolze; Dr. G. Eichhorn πŸ“‚ Article πŸ“… 1976 πŸ› John Wiley and Sons 🌐 English βš– 281 KB

## Abstract AIN was deposited pyrolytically by means of the aluminium trichloride‐ammonia process (either introducing both compounds seperately or in complex form) and by plasmachemical reaction of aluminium trichloride with nitrogen at temperatures from 600 to 1300Β°C. Layers deposited onto (100) s