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Vanadocene used as a precursor for the chemical vapor deposition of vanadium carbide at atmospheric pressure

✍ Scribed by L. Poirier; O. Richard; M. Ducarroir; M. Nadal; F. Teyssandier; F. Laurent; O. Cyr-Athis; R. Choukroun; L. Valade; P. Cassoux

Publisher: Elsevier Science
Year: 1994
Tongue: English
Weight: 682 KB
Volume: 249
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(94)90086-8

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