UV-O3 and dry-O2: Two-step-annealed chemical vapor-deposited Ta2O5 films for storage dielectrics of 64-Mb DRAMs

✍ Scribed by Shinriki, H.; Nakata, M.

• Book ID: 114537623
• Publisher: IEEE
• Year: 1991
• Tongue: English
• Weight: 915 KB
• Volume: 38
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/16.75185