DRAM plate electrode bias optimization for reducing leakage current in UV-O3 and O2 annealed CVD deposited Ta2O5 dielectric films

✍ Scribed by Madan, S.K.

• Book ID: 114536297
• Publisher: IEEE
• Year: 1995
• Tongue: English
• Weight: 344 KB
• Volume: 42
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/16.464405