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Use of low-temperature plasma in treatment of textiles

✍ Scribed by L. V. Sharnina; B. N. Mel'nikov; I. B. Blinicheva


Publisher
Springer US
Year
1996
Tongue
English
Weight
263 KB
Volume
28
Category
Article
ISSN
0015-0541

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Low-temperature treatment of Si/SiO2 str
✍ A Szekeres; S Alexandrova πŸ“‚ Article πŸ“… 1996 πŸ› Elsevier Science 🌐 English βš– 500 KB

SVSiO, srructures formed by thermal oxidation of n-type (1 IllSi and treated in an RF hydrogen plasma at temperatures ranging from 20 to 300Β°C were investigated. The plasma exposure led to annealing of postoxidation defects related to fixed positive oxide charges and interface stares but created int