Double unbalanced magnetron sputtering s
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S Groudeva-Zotova
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Article
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1998
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Elsevier Science
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English
β 400 KB
Detailed characterization of a newly developed sputtering system consisting of two symmetrically inclined unbalanced magnetron sputtering devices, to be used for ion-assisted deposition of two component alloy thin films, is made. The working characteristics of the double magnetron system are compare