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Ultrathin gate oxide grown on nitrogen-implanted silicon for deep submicron CMOS transistors

✍ Scribed by In-Ho Nam; Jae Sung Sim; Sung In Hong; Byung-Gook Park; Jong Duk Lee; Seung-Woo Lee; Man-Sug Kang; Young-Wug Kim; Kwang-Pyuk Suh; Won Seong Lee


Book ID
114538869
Publisher
IEEE
Year
2001
Tongue
English
Weight
181 KB
Volume
48
Category
Article
ISSN
0018-9383

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