β Scribed by E.M. Stuve; J.W. Rogers Jr.; D. Ingersoll; D.W. Goodman; M.L. Thomas; Mark T. Paffett
No coin nor oath required. For personal study only.
Sub-monolayer to multilayer quantities of Cu on a Ru(0001) substrate was studied both in ultrahigh vacuum (UHV) and in an electrochemical cell (EC )_ The experimental apparatus consisted of an EC attached directly to a UHV chamber with facilities for Auger electron spectroscopy (AES) and thermal desorption spectroscopy (TDS). The UHV and electrochemical methods were compared directly via a series of co-characterization experiments in which Cu was deposited in the UHV environment and characterized electrochemically. A comparison of the linear sweep stripping and TDS of vacuum deposited Cu showed that the difference in the heat of desorption between multilayer and monolayer Cu was z 6 kcal/mol and was approximately the same for both methods.
π SIMILAR VOLUMES
The interaction of CO, H, NHg, CH,OH, H20, and C\*H,, with ultrathin Cu films supported on Ru (000 1) has been studied by means of XPS and TPD. For films with O,,< I, adsorption ofC0, &X4, and H induced shifts of +0.5, +0.3, and +0.25 eV, respectively, in the Cu(2p,,,) peak position. Negligible shif