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[Ultra Clean Soc ISSM2000. Ninth International Symposium on Semiconductor Manufacturing - Tokyo, Japan (26-28 Sept. 2000)] Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) - Damage-free contact etching using balanced electron drift magnetron etcher

✍ Scribed by Kaihara, R.; Hirayama, M.; Sugawa, S.; Ohmil, T.

Book ID: 126688435
Publisher: Ultra Clean Soc
Year: 2000
Weight: 449 KB
Category: Article
ISBN-13: 9780780373921
DOI: 10.1109/ISSM.2000.993626

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