๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Two types of neutral electron traps generated in the gate silicon dioxide

โœ Scribed by Wei Dong Zhang; Zhang, J.F.; Lalor, A.; Burton, D.; Groeseneken, G.V.; Degraeve, R.


Book ID
114616888
Publisher
IEEE
Year
2002
Tongue
English
Weight
480 KB
Volume
49
Category
Article
ISSN
0018-9383

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


On the mechanism of electron trap genera
โœ W.D Zhang; J.F Zhang; M Lalor; D Burton; G Groeseneken; R Degraeve ๐Ÿ“‚ Article ๐Ÿ“… 2001 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 131 KB

This paper investigates the applicability of the proposed models for electron trap generation in gate oxides. It is found that neither the electron-hole recombination nor the high oxide field itself is the main source for the generation. Although the hole injection alone can generate traps, the elec