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Tungsten imido complexes as precursors to tungsten carbonitride thin films

✍ Scribed by Potts, Stephen E.; Carmalt, Claire J.; Blackman, Christopher S.; Leese, Thomas; Davies, Hywel O.


Book ID
127003377
Publisher
Royal Society of Chemistry
Year
2008
Tongue
English
Weight
466 KB
Volume
42
Category
Article
ISSN
1477-9226

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Ceramic thin films containing titanium, vanadium, carbon, oxygen and nitrogen were obtained on steel substrates at 873 K, under nitrogen and helium gases and at low pressure, by chemical vapor deposition (CVD) from two organometallic precursors, CpTiCl 2 N(SiMe 3 ) 2 and Cp 2 VMe 2 (Cp, cyclopentadi