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Tungsten Allylimido Complexes Cl 4 (RCN)W(NC 3 H 5 ) as Single-Source CVD Precursors for WN x C y Thin Films. Correlation of Precursor Fragmentation to Film Properties

✍ Scribed by Bchir, Omar J.; Green, Kelly M.; Ajmera, Hiral M.; Zapp, Elizabeth A.; Anderson, Timothy J.; Brooks, Benjamin C.; Reitfort, Laurel L.; Powell, David H.; Abboud, Khalil A.; McElwee-White, Lisa


Book ID
127284002
Publisher
American Chemical Society
Year
2005
Tongue
English
Weight
499 KB
Volume
127
Category
Article
ISSN
0002-7863

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