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Tunable Nanocellular Polymeric Monoliths Using Fluorinated Block Copolymer Templates and Supercritical Carbon Dioxide

✍ Scribed by By H. Yokoyama; L. Li; T. Nemoto; K. Sugiyama

Publisher: John Wiley and Sons
Year: 2004
Tongue: English
Weight: 463 KB
Volume: 16
Category: Article
ISSN: 0935-9648
DOI: 10.1002/adma.200400072

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A topographic image of the PS-PFMA film after the scCO 2 process using 25 MPa saturated pressure. The original film thickness was 81 nm before the scCO 2 process. The full-scale height is 16 nm. The bar indicates 200 nm.