Facile Fabrication of Nanocellular Block Copolymer Thin Films Using Supercritical Carbon Dioxide

✍ Scribed by L. Li; H. Yokoyama; T. Nemoto; K. Sugiyama

• Publisher: John Wiley and Sons
• Year: 2004
• Tongue: English
• Weight: 136 KB
• Volume: 16
• Category: Article
• ISSN: 0935-9648
• DOI: 10.1002/adma.200400264

✦ Synopsis

A topographic image of the PS-PFMA film after the scCO 2 process using 25 MPa saturated pressure. The original film thickness was 81 nm before the scCO 2 process. The full-scale height is 16 nm. The bar indicates 200 nm.