Tunable Luminescence from a Silicon-Rich Oxide Microresonator
β Scribed by A. Hryciw; J. Laforge; C. Blois; M. Glover; A. Meldrum
- Publisher
- John Wiley and Sons
- Year
- 2005
- Tongue
- English
- Weight
- 332 KB
- Volume
- 17
- Category
- Article
- ISSN
- 0935-9648
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Nd-and Er-doped silicon rich oxide (SRO) thin films were prepared by rf-sputtering. Different films were obtained by changing target configurations. Al and Al 2 O 3 targets were used to obtain along with silicon rich silicon oxide (SRSO) films, Al-modified SRSO films and silicon rich aluminosilicate
The silicon-rich oxide (SiO x ) films were deposited using the LPCVD (Low Pressure Chemical Vapour Deposition) method at the temperature of 570 Β°C and with silane and oxygen as the reactant gasses. The films were deposited on silicon (1 1 1) substrates. The flows of oxygen and silan in the horizonta