Barrier and electrode properties of high
Barrier and electrode properties of high Tc Josephson junctions formed by a plasma discharge process
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E. Aharoni; G. Koren; E. Polturak; D. Cohen
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Article
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1993
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Elsevier Science
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English
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The influence of rf discharge in CF4 and O~ gases on the properties of thin YBCO films and edge junctions was investigated by transport ,neasurements and Auger spectroscopy. It was found that oxygen plasma of short duration can serve as a cleaning step before tile formation of the barrier. In contra